ANYL 184 |
| In the photolithographic process, information in the form of exposed and unexposed material is transferred to a sacrificial photoresist film in the exposure tool. Through a series of processing steps patterned features are ultimately created from that information that can then define components of devices or other functional materials. As feature dimensions shrink below 30 nm, however, the fidelity of the transferred information using current resists may not meet manufacturing requirements. We are investigating the insertion of self-assembling block copolymers into the lithographic process for improved information transfer, process control, and resolution. Our approach is to lithographically define chemically patterned surfaces to direct the assembly of overlying films of block copolymers and block copolymer/homopolymer blends. We demonstrate that through tailored interfacial interactions, it is possible to pattern: 1) sub 15 nm features with perfection and registration, 2) features with thermodynamic and precise (sub 1 nm) control over their dimensions and shapes, and 3) almost the entire set of essential features required (regular fabric architectures) for integrated circuit fabrication. In this presentation we will emphasize new strategies for creating and replicating nanoscale chemical surface patterns. These strategies eliminate the necessity of lithographic patterning at or near the dimension of the block copolymer material for each chip, provide a path for improved or sub-lithographic resolution, and are suitable for high-volume manufacturing. |
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Directed Assemblies Using Surface Templates
1:25 PM-4:45 PM, Wednesday, April 9, 2008 Morial Convention Center -- Rm. 335, Oral
Division of Analytical Chemistry |