Phase and rheological behavior of trisilanol-POSS derivatives at the air/water interface: Model nanofillers for Langmuir film studies

POLY 92

Wen Yin, wyin@vt.edu, Jianjun Deng, and Alan R. Esker, aesker@vt.edu. Department of Chemistry (0212), Virginia Tech, Blacksburg, VA 24061
Polyhederal oligomeric silsesquioxanes (POSS) have attracted considerable interest in the past two decades. The unique inorganic-organic core-shell structure can be incorporated into polymeric systems as copolymers or fillers to create dielectric, shape memory, space survivable, and high temperature materials. The study of POSS molecules at the air/water (A/W) interface can serve as ideal model 2D systems for understanding the phase behavior of POSS and POSS/polymer blends. Five trisilanol-POSS derivatives are examined through surface pressure – surface concentration isotherms and surface light scattering (SLS) at the A/W interface. The results indicate that all five trisilanol-POSS derivatives form Langmuir film at the A/W interface. Trisilanolcyclohexyl-POSS and trisilanolcyclopentyl-POSS form the most rigid films and can also form higher ordered 3D structures during film collapse, while trisilanolisobutyl-POSS and trisilanolethyl-POSS are comparatively softer films. The latter two derivatives form less ordered multilayer structures after collapse. Trisilanolphenyl-POSS shows behavior lying between the “rigid” and “soft” trisilanol-POSS derivatives.
 

General Papers
2:00 PM-4:20 PM, Sunday, April 6, 2008 Hilton New Orleans Riverside -- Grand Salon 4, Oral

Division of Polymer Chemistry

The 235th ACS National Meeting, New Orleans, LA, April 6-10, 2008