Directed assembly of polymer blends on nanoscale patterned self assembled monolayers

ANYL 185

Jason T Chiota1, John DM Shearer2, Jun Lee3, Ming Wei, Ming_Wei@uml.edu4, Carol MF. Barry5, and Joey L. Mead5. (1) Department of Plastics Engineering, NSF Nanoscale Science and Engineering Center for High-rate Nanomanufacturing, University of Massachusetts Lowell, 1 University Avenue, Lowell, MA 01854, (2) Department of Plastics Engineering, NSF Nanoscale Science and Engineering Center for High-rate Nanomanufacturing, University of Massachusetts Lowell, 1 University Avenue, Lowell, MA 01854, (3) Department of Plastics Engineering, NSF Nanoscale Science and Engineering Center for High-rate Nanomanufacturing, University of Massachusetts Lowell, One University Ave, Lowell, MA 01854, (4) Department of Plastics Engineering, NSF Nanoscale Science and Engineering Center for High-rate Nanomanufacturing, University of Masschusetts Lowell, One univeresity Avenue, Lowell, MA 01854, (5) Department of Plastics Engineering and Center for High-Rate Nanomanufacturing, University of Massachusetts Lowell, 1 University Avenue, Lowell, MA 01854
This work investigates the nanoscale assembly of polymer blends using chemically modified surfaces to direct phase decomposition. Solutions of polystyrene (PS) and polymethyl methacrylate (PMMA) were drop cast onto a gold-coated mica wafer, which had been patterned with a hydrophilic alkanethiol using dip-pen nanolithography (DPN). Pattern geometry was printed using 16-mercaptohexadecanoic acid (MHA) and the pattern was subsequently backfilled with a hydrophobic thiol; either 1-octadecanethiol (ODT) or benzenethiol (BZT), forming patterns of different chemical characteristics. The effect of pattern geometry, thiol type, and process conditions on the ability to control polymer deposition and patterning are compared.
 

Directed Assemblies Using Surface Templates
1:25 PM-4:45 PM, Wednesday, April 9, 2008 Morial Convention Center -- Rm. 335, Oral

Division of Analytical Chemistry

The 235th ACS National Meeting, New Orleans, LA, April 6-10, 2008