Orientation control of block copolymer thin films

POLY 122

Evelyn Auyeung, chemistry@amherst.edu1, Joy Y. Cheng2, and Daniel P. Sanders2. (1) Department of Chemistry, Amherst College, AC#2243, Amherst, MA 01002, (2) IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120
Lamellae-forming poly(styrene-block-methyl methacrylate) [P(S-b-MMA)] is spin-casted onto silicon substrates with an underlayer containing an orientation control component. Given that a sufficient amount of an orientation control component is added, the block copolymer uniformly phase segregates perpendicular to the underlayer. Reasonable ranges of block copolymer solvent polarity, underlayer film thickness, and annealing time give similar well-oriented film morphologies, giving insight into a better understanding of the extent and methods of orientation control for this system.
 

Undergraduate Research in Polymer Science
6:00 PM-8:00 PM, Sunday, April 6, 2008 Morial Convention Center -- Hall A, Poster

Division of Polymer Chemistry

The 235th ACS National Meeting, New Orleans, LA, April 6-10, 2008