Instability in nanoimprinted structures

PMSE 146

Kyle J. Alvine, kalvine@nist.gov, Hyun Wook Ro, Yifu Ding, yding@nist.gov, Brian Okerberg, Jack F. Douglas, jack.douglas@nist.gov, Alamgir Karim, alamgir.karim@nist.gov, and Christopher L. Soles, christopher.soles@nist.gov. Polymers Division, National Institute of Standards and Technology, 100 Bureau Drive, MS 8541, Gaithersburg, MD 20899
In order to meet the demand for producing smaller and more dense nanoscale patterns, NanoImprint Lithography must address the dual challenges of mold release and feature thermal stability. Fluorinated additives in the polymer can reduce mold adhesion and improve release properties. The effects of these additives on the thermal stability of nanopatterns are not well understood. Here we present studies on the thermal stability of nanoscale diffraction patterns created with thermal embossing NanoImprint lithography with fluorosurfactant additives.
 

Mechanical Instabilities in Polymer Films, Interfaces and Nanostructures
8:30 AM-12:00 PM, Tuesday, April 8, 2008 Hilton New Orleans Riverside -- Grand Salon 22, Oral

Division of Polymeric Materials: Science & Engineering

The 235th ACS National Meeting, New Orleans, LA, April 6-10, 2008