Optimizing layer thickness in porous silicon vapor sensors

CHED 258

Devin Douglas Swanson, devindswanson@student.cofo.edu1, YuChun Lu2, Katie L. Campbell3, Chris Lee2, and Roger H. Terrill2. (1) Department of Chemistry, College of the Ozarks, Pt. Lookout, MO 65726, (2) Department of Chemistry, San Jose State University, (3) Department of Biomedical Engineering, Virginia Commonwealth University
Iridescent layers of porous silicon are formed when polished silicon crystal surfaces are electrochemically etched in hydrofluoric acid. The combination of porosity and optical interference renders these layers useful in chemical and biological sensing. Our study has enhanced the basic understanding of porous silicon as a vapor sensor. A variety of experiments have been conducted to illustrate pore characterization (SEM and FTIR) and optimization of the vapor sensitivity.
 

Undergraduate Research Poster Session: Analytical Chemistry
11:00 AM-1:00 PM, Monday, April 7, 2008 Morial Convention Center -- Hall A, Poster

Division of Chemical Education

The 235th ACS National Meeting, New Orleans, LA, April 6-10, 2008