PMSEWednesday, August 22, 2007
8:30 AM-12:00 PM Westin Boston Waterfront -- Adams, Oral
Nano- and Micro-Scale Porous Polymer-Based Systems
Low-k Materials
Organizers:Neil R. Cameron
Bradley F. Chmelka
Official:Michael S. Silverstein
8:30 AM444Methods for porosity characterization of porous SiLK dielectric films
Brian G. Landes, Carol Mohler, Gregory F. Meyers, Brandon J. Kern, Sergei Maganov, John Quintana, Steven J. Weigand
9:00 AM445Bridged oxycarbosilane polymers: Porous organosilicates are not necessarily fragile
R. D. Miller, Geraud Dubois, Teddie Magbitang, Willi Volksen, Reinhold H. Dauskardt, Max Gage
9:30 AM446Challenges of plasma damage of low dielectric constant materials
Mikhail R. Baklanov, Adam M. Urbanowicz, Serge Vanhaelemeersch
10:00 AM Intermission
10:10 AM447Neutron and x-ray measurements of pore size distributions in low-k thin films
Barry J. Bauer, Ronald C. Hedden, Michael S. Silverstein, Hae-Jeong Lee, Christopher L. Soles, Da-Wei Liu, Eric K. Lin, Wen-Li Wu
10:40 AM448Nanoimprint patterning of high modulus, spin-on organosilicate glasses: The impact on pattern quality and porosity
Hyun Wook Ro, Hae-Jeong Lee, Alamgir Karim, David W. Gidley, Do Y. Yoon, Christopher L. Soles
11:00 AM449Thermally cross-linkable cyclolinear polycarbosilanes (CLPCS) as low-k materials
Jitendra S Rathore, Leonard V Interrante
11:20 AM450Nanoporous SiwOxCyHz thin film deposited by plasma as low k for microelectronics
Laurent Favennec, Vincent Jousseaume, Aziz Zenasni, Guillaume Gerbaud, Patrick Maury
11:40 AM451Nanoporous thin films based on norbornene copolymers
Sewon Oh, Kookheon Char

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The 234th ACS National Meeting, Boston, MA, August 19-23, 2007