INORMonday, August 20, 2007

8:30 AM-12:10 PM BCEC -- 258C, Oral
Thin Films: Chemical Vapor Deposition and Atomic Layer Deposition
Officials:Gregory S. Girolami
Wayne L. Gladfelter
8:30 AMIntroductory Remarks
8:40 AMDesign of precursors for CVD and ALD
Roy G. Gordon
9:10 AMSurface activation: True ALD of copper films?
Jeffery S Thompson
9:40 AMMolecular precursor routes to gallium oxide
Claire J. Carmalt, Siama Basharat
10:10 AMIntermission
10:40 AMPyrazolate-based precursors for the growth of thin films by atomic layer deposition
Charles H. Winter, Charles L. Dezelah IV, Monika K. Wiedmann, Mark J. Saly, Lauri Niinistö
11:10 AMDeposition of thin films in supercritical carbon dioxide
Theodosia Gougousi
11:40 AMCombinatorial chemical vapor deposition and atomic layer deposition of mixed metal oxide films
Wayne L. Gladfelter, Tyler L. Moersch, Bin Xia, David C. Boyd, Dan Yu, Stephen A. Campbell

Thin Films: Chemical Vapor Deposition and Atomic Layer Deposition -- Next Session

Symposium Grid -- Division of Inorganic Chemistry -- Session Listing

Symposium Grid -- Material Innovations -- Session Listing

The 234th ACS National Meeting, Boston, MA, August 19-23, 2007