COLL 91 |
| Soft lithography has been widely used to pattern polymer, molecules or nanoparticles into various nanostructures. However, due to the elastomeric nature of the PDMS mold, patterns could be distorted during the fabrication. Here, we used the problematic pattern distortion to our advantage and developed a novel distortion-assisted soft lithography method that can easily generate large areas of well-ordered sub-100nm features from originally micron-sized elastomer patterns. We demonstrated direct assembly and printing of superparamagnetic nanoparticles into large periodic magnetic nano-islands array (width less than 100nm) with different shapes (e.g. spears, cirles or ellipsoids) onto various substrates. We found that this method could also be applicable to patterning many other nanoparticles of interests, such as metallic nanoparticles and quantum dots. We believe this distortion-assisted soft lithography technique can greatly broaden the applicability of traditional soft lithography and shed new lights on building high density magnetic storage, plasmonic and electronic devices. |
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Chemically and Topographically Textured Surfaces
8:30 AM-12:00 PM, Monday, August 20, 2007 BCEC -- 153A, Oral
Division of Colloid & Surface Chemistry |