COLL 84 |
| High-quality chemical patterns have been generated with tailored functionality and directed alignment by employing lithographic processing compatible with molecular self-assembly. We have optimized a lithographic method incorporating a resist that permits novel chemical patterning schemes for fabricating multi-component films. The lithographic resist is patterned atop a self-assembled monolayer (SAM), the pattern is transferred by photooxidation, and a different SAM is deposited into the exposed regions. Then the resist is removed while maintaining the functionality that has been patterned onto the substrate. This robust lithographic resist can withstand the photooxidative and chemical conditions utilized for pattern transfer; and it also acts as an important shield protecting against cross-contamination. Uncommon to competing patterning techniques, this method has the advantage of preventing molecular exchange and intercalation, as well as having the ability to align multiple levels of registered patterning, transfer reproducible one-to-one feature sizes, and perform parallel processing. The functionality of these films has been demonstrated using directed colloidal assembly and by surface-bound antibody recognition observed with fluorescence microscopy. |
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Chemically and Topographically Textured Surfaces
8:30 AM-12:00 PM, Monday, August 20, 2007 BCEC -- 153A, Oral
Division of Colloid & Surface Chemistry |