Formation of a tantalum oxo complex from the reaction of Ta(NMe2)4Cl with water

INOR 310

Tara N. Williams, twilliams@ion.chem.utk.edu, Shujian Chen, Hu Cai, and Zi-Ling Xue, xue@ion.chem.utk.edu. Department of Chemistry, University of Tennessee, Knoxville, TN 37996-1600
Reactions of metal complexes with water have been used in the formation of metal oxide thin films as new high-dielectric constant, gate insulating materials in the new generations of microelectronic devices. When Ta(NMe2)4Cl is exposed to H2O, elimination of HNMe2 has been observed, yielding dimeric (Me2N)3(Cl)Ta(µ-O)Ta(Cl)(NMe2)3. Our studies of the reaction and characterization of the products will be reported.
 

Synthetic Coordination Chemistry
7:00 PM-10:00 PM, Sunday, August 19, 2007 BCEC -- Exhibit Hall - B2, Poster

Division of Inorganic Chemistry

The 234th ACS National Meeting, Boston, MA, August 19-23, 2007