Scalable nonlithograohic approach to fabricate wafer-scale subsurface textures for improving the conversion efficiency of silicon solar cells

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Chih-hung Sun, csun@che.ufl.edu1, Nicholas Linn, nclinn@ufl.edu1, Bin Jiang, bjiang@pdx.edu2, and Peng Jiang, pjiang@che.ufl.edu1. (1) Department of Chemical Engineering, University of Florida, Gainesville, FL 32611, (2) Department of Mathematics and Statistics, Portland State University, Portland, OR 97207
Current production of solar cells is dominated by crystalline silicon modules; however, due to the high refractive index of silicon, more than 30% of incident light is reflected back, which greatly reduces the conversion efficiency of photovoltaic devices. Surface texturing has become a common practice for Si solar cells, and, in combination with vacuum deposited antireflection coatings (ARCs), reduces reflection losses to a few percent. Unfortunately, the high cost of vacuum deposition of ARCs is a big challenge for economic production of large photovoltaic panels. Here we present a simple yet scalable non-linthographic approach to fabricate subwavelength surface textures for improving the conversion efficiency of crystalline silicon solar cells. Wafer-scale, crystalline arrays of inverted pyramids with adjustable geometries, which directly function as efficient moth-eye ARCs, are anisotropically etched in silicon substrates by using templated metallic nanohole arrays as etching masks. These periodic nanoholes are replicated from non-close-packed monolayer colloidal arrays made by a simple spin-coating technique. Our optical measurements and theoretical calculations show that the pyramidal moth-eye ARCs can reduce the reflectivity by almost two orders of magnitude for a wide wavelength range.