Matrix isolation infrared spectroscopy was used to characterize the complex of H₂Si with N₂ that results from the vacuum-ultraviolet photolysis of silane (SiH₄) in nitrogen (N₂).  Experiments were performed by depositing mixtures of SiH₄ with N₂ onto a CsI window at 12 K while simultaneously photolyzing the mixture with 121 nm vacuum-ultraviolet radiation using a hydrogen resonance lamp.  The infrared bands of the H₂Si·N₂ complex observed in these experiments were the N–N stretching mode between 2274 – 2266 cm^-1 and the SiH₂ asymmetric and symmetric stretching modes between 2024 – 2009 cm^-1.  The assignment of these bands to the H₂Si·N₂ complex was established by performing experiments with isotopic reagents (SiD₄, ¹⁵N₂), by performing matrix annealing experiments (warming to 20 and 30 K and refreezing to 12 K), by performing mercury-xenon lamp matrix photolysis experiments, and by comparison to ab initio and density functional theory calculations.  In addition to the H₂Si·N₂ complex, the complex of Si with N₂ (Si·N₂) was also observed in these experiments.