POLY 200 |
| A new method for preparing pretextured surface patterns on Aluminum with hole intervals of ~45nm will be described.The holes can initiate pores and guide the growth of channels during anodization. Solvent-induced reconstruction of a block copolymer monolayer pattern is the basis for the lithography. Using Reactive Ion Etching, fine patterns on Al were prepared and its subsequent anodization in concentrated sulfuric acid enabled the formation of channels with high order. The method using block copolymer patterns as templates has great potential to fabricate sub-50nm porous alumina since the pore periodicity and pore separation can be controlled at the synthesis stage by changing the molecular weight of the block copolymers. |
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General Papers: Polymers in Nanotechnology
6:00 PM-8:00 PM, Sunday, August 19, 2007 BCEC -- Exhibit Hall - B2, Poster
Sci-Mix
Division of Polymer Chemistry |