Chemical vapor deposition of WNxCy thin films using tungsten hydrazido complexes

INOR 740

Juergen Koller, jkoller@chem.ufl.edu1, Hiral M. Ajmera, hajmera@che.ufl.edu2, Timothy J. Anderson, tim@ufl.edu2, and Lisa McElwee-White, lmwhite@chem.ufl.edu1. (1) Department of Chemistry, University of Florida, Gainesville, FL 32611-7200, (2) Department of Chemical Engineering, University of Florida, P.O. Box 116005, Gainesville, FL 32611-6005
The tungsten hydrazido complexes (Cl4(CH3CN)W(NNR2) [R2 = Me2, Ph2, (CH2)5] were synthesized and used to deposit tungsten nitride carbide (WNxCy) films from benzontrile solutions with hydrogen as the carrier gas. Film composition, crystallinity, lattice parameter, grain size, growth rate and electrical resistivity will be discussed.
 

Thin Films: Chemical Vapor Deposition and Atomic Layer Deposition
7:00 PM-10:00 PM, Tuesday, August 21, 2007 BCEC -- Exhibit Hall - B2, Poster

Sci-Mix
8:00 PM-10:00 PM, Monday, August 20, 2007 BCEC -- Exhibit Hall - B2, Sci-Mix

Division of Inorganic Chemistry

The 234th ACS National Meeting, Boston, MA, August 19-23, 2007