INOR 741 |
| Atmospheric pressure chemical vapour deposition (APCVD) of tungsten selenide films on glass substrates has been achieved by reaction of diethyl selenide with WCl6 at 500–650 °C. X-Ray diffraction showed that the WSe2 films were crystalline with cell constants close to those expected– some preferred orientation was noted at higher deposition temperature. Energy-dispersive analysis by X-rays (EDAX) gave a W : Se ratio close to 1 : 2 for all the films formed at 550 °C. The films were matt black in appearance, were adhesive, passed the Scotch tape test but could be scratched with a steel scalpel. SEM showed that the films were composed of either plate or needle like crystals which become longer and thicker with increasing deposition temperature. The films were highly hydrophobic with contact angles for water droplets in the range of 135–145°. Furthermore these surfaces were highly adherent for water droplets– that did not roll or slide even at a tilt angle of 90°. |
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Thin Films: Chemical Vapor Deposition and Atomic Layer Deposition
7:00 PM-10:00 PM, Tuesday, August 21, 2007 BCEC -- Exhibit Hall - B2, Poster
Division of Inorganic Chemistry |