CS radical detection during the HFCVD of diamond thin film deposition by CRDS

PHYS 331

Vladimir Makarov, makarov@adam.uprr.pr1, Madalina Buzaianu, bmdora@gmail.com2, Brad R. Weiner, brad@adam.uprr.pr1, and Gerardo Morell, gmorell@rrpac.upr.clu.edu2. (1) Department of Chemistry, University of Puerto Rico, PO Box 23346, San Juan, PR 00931-3346, (2) Department of Physics, University of Puerto Rico, Rio Puedras PO Box 23343, Facundo Bueso 146, San Juan, PR 00931
CS radical was detected using Cavity Ringdown Spectroscopy (CRDS) during the Hot Filament CVD of diamond thin film for the CH4 / H2 mixture doped by H2S. The absolute absorption optical density of the CS radical was obtained. The concentration of this radical was estimated as function of the CH4 and H2S concentrations. It was found that the substrate coated by microcrystalline diamond thin film significantly influences the character of the SH concentration dependence on the CH4 concentration. It is shown that in the presence of substrate the heterogeneous sources of the CS radical generation play a more important role than in the experiments without substrate. The relationship between the heterogeneous and homogeneous channels of the CS radical generation was estimated in the presence/absence of substrate.
 

Physical Chemistry Poster Session
7:00 PM-9:00 PM, Wednesday, August 22, 2007 BCEC -- Exhibit Hall - B2, Poster

Division of Physical Chemistry

The 234th ACS National Meeting, Boston, MA, August 19-23, 2007