PMSETuesday, 12 September 2006

1:00 PM-5:20 PM San Francisco Marriott -- Salon C2, Oral
Self-Assembly Approaches for Nanopatterning
Nanoscale Printing and Writing
Organizers:Younan Xia
L. Andrew Lyon
Timothy J. Bunning
Organizer, Presiding:Hong Yang
1:00 PMIntroductory Remarks
1:05 PMSurface-initiated photopolymerization on structured self-assembled monolayers
Marin Steenackers, Ursula Schmelmer, Rainer Jordan, Anne Paul, Alexander Küller, Michael Grunze, Armin Gölzhäuser, Abraham Ulman
1:25 PMElectrochemical nanopatterning of polyelectrolyte layer-by-layer self-assembled ultrathin films
Rigoberto C. Advincula
1:45 PMSurface-templated polymer patterning with dip-pen nanolithography
Joseph H. Wei, David C. Coffey, David S. Ginger Jr.
2:25 PMSelf-organized surface patterning
Lifeng Chi, Xiaodong Chen, Michael Hirtz
3:05 PMIntermission
3:20 PMMassively parallel dip-pen nanolithography
Chad A. Mirkin
4:00 PMMicro- and nanoscale patterning of alkanethiol monolayers on gold using edge-spreading lithography: Principles and applications
Matthias Geissler
4:40 PMTopography printing to locally control wettability
Zijian Zheng, Omar Azzaroni, Feng Zhou, Wilhelm T. S. Huck
5:00 PMPatterning self-organized and self-assembled porphyrinoid materials
Charles Michael Drain

Self-Assembly Approaches for Nanopatterning -- Next Session

Symposium Grid -- Division of Polymeric Materials: Science & Engineering -- Session Listing

Symposium Grid -- Nanotechnology -- Session Listing

The 232nd ACS National Meeting, San Francisco, CA, September 10-14, 2006