| PMSE | Tuesday, 12 September 2006 | ||
1:00 PM-5:20 PM San Francisco Marriott -- Salon C2, Oral | |||
Self-Assembly Approaches for Nanopatterning | |||
| Nanoscale Printing and Writing | |||
| Organizers: | Younan Xia L. Andrew Lyon Timothy J. Bunning | ||
| Organizer, Presiding: | Hong Yang | ||
| 1:00 PM | Introductory Remarks | ||
| 1:05 PM | 212 | Surface-initiated photopolymerization on structured self-assembled monolayers Marin Steenackers, Ursula Schmelmer, Rainer Jordan, Anne Paul, Alexander Küller, Michael Grunze, Armin Gölzhäuser, Abraham Ulman | |
| 1:25 PM | 213 | Electrochemical nanopatterning of polyelectrolyte layer-by-layer self-assembled ultrathin films Rigoberto C. Advincula | |
| 1:45 PM | 214 | Surface-templated polymer patterning with dip-pen nanolithography Joseph H. Wei, David C. Coffey, David S. Ginger Jr. | |
| 2:25 PM | 215 | Self-organized surface patterning Lifeng Chi, Xiaodong Chen, Michael Hirtz | |
| 3:05 PM | Intermission | ||
| 3:20 PM | 216 | Massively parallel dip-pen nanolithography Chad A. Mirkin | |
| 4:00 PM | 217 | Micro- and nanoscale patterning of alkanethiol monolayers on gold using edge-spreading lithography: Principles and applications Matthias Geissler | |
| 4:40 PM | 218 | Topography printing to locally control wettability Zijian Zheng, Omar Azzaroni, Feng Zhou, Wilhelm T. S. Huck | |
| 5:00 PM | 219 | Patterning self-organized and self-assembled porphyrinoid materials Charles Michael Drain | |
Self-Assembly Approaches for Nanopatterning -- Next Session
Symposium Grid -- Division of Polymeric Materials: Science & Engineering -- Session Listing
Symposium Grid -- Nanotechnology -- Session Listing
The 232nd ACS National Meeting, San Francisco, CA, September 10-14, 2006