Ion effects on trisilanolphenyl-POSS as an adhesion promoter

POLY 617

Sarah M. Huffer, and Alan R. Esker, Department of Chemistry (0212), Virginia Tech, Blacksburg, VA 24061
Polyhedral oligomeric silsesquioxanes (POSS) have been an innovative area of research for more than twenty years. The purpose of this study was to improve adhesion between ceramics and metals and metals and polymers by preparing multilayer films with varying metal ion concentrations using trisilanolphenyl-POSS (TPP). These multilayer systems were prepared by spincoating to make the polymer (polystyrene) layer, the Langmuir-Blodgett technique to create the TPP layer, and physical vapor deposition to produce the alumina layer. The resulting films were characterized for quality and stability using atomic force microscopy, optical microscopy, X-ray photoelectron spectroscopy, and dewetting experiments. Results demonstrated that TPP-aluminum ion complexes promoted a smooth alumina film on silicon, whereas vapor-deposited alumina exhibited blistered and cracked surface morphologies on silicon substrates coated with TPP. Dewetting experiments showed that the polystyrene layer completely dewet on TPP-coated silica, but the TPP-aluminum ion complexes suppressed polystyrene dewetting on silica.