POLY 131 |
| This study in photolithography involved on-press developable (switchable) plate formation. Historically, the process required a dissolution step in an alkaline developer or other chemical. In view of global environmental protection and green chemistry initiatives, the disposal of the developer waste is a matter of concern. There are increased demands for improvements of wet processing or no processing. This research discusses a method for direct formulation of a photoresist, a light sensitive composition having the capability to change its nature from hydrophilic to hydrophobic upon radiation. The photoresist is coated thinly onto a substrate (aluminum) producing a hydrophilic surface. The polarity change of a negative working photoresist is observed on-press (reproduction to paper) with radiated areas having ink receptive properties (hydrophobic) and non-imaged areas having water accepting properties (hydrophilic). Photoresists prepared with poly (betaine) compositions have been proven to exhibit this characteristic. This is a novel concept for lithography and has proven to be an efficient way to eliminate processing. |
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General Papers: Polymers in Nanotechnology
6:00 PM-8:00 PM, Sunday, 10 September 2006 Moscone Center -- Hall D, Poster
Sci-Mix
Division of Polymer Chemistry |