PMSE 291 |
| Industry has sought for novel polymers for applied nanotechnology to satisfy our diverse demands in miniaturization. Soft lithography has attracted much interest for micro- or nano-fabrication as an alternative to conventional UV photolithography. Since there are limitations of this technology for developing high resolution pattern transfers, especially in the nano-scale regime, we designed and synthesized a new family of photocurable PDMS polymers to be used as photopatternable silicon elastomers to achieve advanced soft lithography. |
|
Joint PMSE/POLY Poster Session
6:00 PM-8:00 PM, Tuesday, 12 September 2006 Moscone Center -- Hall D, Poster
Sci-Mix
Division of Polymeric Materials: Science & Engineering |