Surface-initiated photopolymerization on structured self-assembled monolayers

PMSE 212

Marin Steenackers, marin.steenackers@mytum.de1, Ursula Schmelmer, ursula.schmelmer@ch.tum.de1, Rainer Jordan, rainer.jordan@ch.tum.de2, Anne Paul, anne.paul@urz.uni-heidelberg.de3, Alexander Küller3, Michael Grunze3, Armin Gölzhäuser, goelzhaeuser@physik.uni-bielefeld.de4, and Abraham Ulman, aulman@duke.poly.edu5. (1) Lehrstuhl für Makromolekulare Stoffe, TU München, Lichtenbergstr. 4, Garching, 85747, Germany, (2) Lehrstuhl für Makromolekulare Stoffe, Technische Universität München, Lichtenbergstr. 4, Garching, Germany, (3) Angewandte Physikalische Chemie, Universität Heidelberg, Im Neuenheimer Feld 253, 69120 Heidelberg, Germany, (4) Physics of Supramolecular Systems, University of Bielefeld, Universitätsstrasse 25, Bielefeld, 33615, Germany, (5) Chemical Engineering Chemistry and Materials Science, Polytechnic University, New York, New York, NY 11201
Structured polymer brushes were synthesised by a combination of the chemical lithography of self-assembled monolayers (SAMs) of functionalised biphenylthiols and amplification of the primary structured by surface-initiated polymerization (SIP). The chemical lithography utilized electron beams to modify SAMs on gold. The irradiation of 4'-nitro-4-mercaptobiphenyl SAMs with electron causes a lateral cross-linking reaction of the biphenyl mesogen with a simultaneous conversion of the nitro groups to amine. The terminal amino groups were converted to azo-initiators that are suitable for the radical polymerization of a broad variety of vinyl compounds. Polymer brushes were generated by photochemical SIP. Precise control of the brush thickness was possible.

[1] Schmelmer, U.; Jordan, R.; Geyer, W.; Eck, W.; Gölzhäuser, A.; Grunze, M.; Ulman, A. Angew. Chem. Int. Ed. 2003, 42, 559

[2] Schmelmer, U.; Paul, A.; Küller, A.; Jordan, R.; Gölzhäuser, A.; Grunze, M.; Ulman, A. Macromol. Symp. 2004, 217, 223

 

Self-Assembly Approaches for Nanopatterning
1:00 PM-5:20 PM, Tuesday, 12 September 2006 San Francisco Marriott -- Salon C2, Oral

Division of Polymeric Materials: Science & Engineering

The 232nd ACS National Meeting, San Francisco, CA, September 10-14, 2006