Session: Polymers For Enabling Nanoscale Patterning


POLY		Wednesday, 29 March 2006

8:30 AM-12:30 PM OMNI at CNN Center -- Dogwood A, Oral
Polymers For Enabling Nanoscale Patterning
Imprint Lithography
Organizer, Presidings:	C. Grant Willson Alfred J. Crosby Kenneth R. Carter
8:30 AM		Introductory Remarks
8:35 AM	312	Organic imaging materials: A view of the future C. Grant Willson
9:00 AM	313	Development of new polymer resists for nanoimprint lithography L. Jay Guo, Carlos Pina-Hernandez, Philip Choi, Xing Cheng, Peng-Fei Fu
9:25 AM	314	Polymer imprint lithography at the molecular scale John A. Rogers
9:50 AM	315	Materials for step-and-flash nanoimprint lithography Hiroshi Ito, F. A. Houle, Mark W. Hart, Richard DiPietro, E Hagberg, Kenneth R. Carter
10:15 AM	316	Quantifying the mechanisms of adhesion and release in imprint lithography Edwin P. Chan, Douglas P. Holmes, John Whang, Alfred J. Crosby
10:40 AM		Intermission
10:50 AM	317	Printing solid inks Ralph G. Nuzzo
11:15 AM	318	Nanocontact molding imprint lithography: Not just another technology to pattern sacrificial polymer resists Kenneth R. Carter, Timothy von Werne, Matthias Beinhoff, Erik C. Hagberg, Sarav B. Jhaveri
11:40 AM	319	Nanoprocessing of polythiophenes: Direct-write and nanoimprint for conductive polymer pattern generation Frank Nichols, Arvind Kumar, Jia Choi, Eric R. Catuccio, Manuel Marquez
12:05 PM	320	Reactive block copolymer film platforms: From tailored biointerfaces to nanoperidic arrays Holger Schönherr, Chuan Liang Feng, G. Julius Vancso

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