Session: Polymers For Enabling Nanoscale Patterning


POLY		Tuesday, 28 March 2006

1:30 PM-4:45 PM OMNI at CNN Center -- Dogwood A, Oral
Polymers For Enabling Nanoscale Patterning
Photolithography
Organizer, Presidings:	C. Grant Willson Alfred J. Crosby Kenneth R. Carter
1:30 PM	266	Non-PFOS photoacid generating compounds for chemically amplified resists Ramakrishnan Ayothi, Yi Yi, Nelson Felix, Christopher K. Ober, Heidi Cao, Wang Yueh
1:55 PM	267	Measurements towards the materials sources of line-edge roughness in chemically amplified photoresists Eric K. Lin, Vivek M. Prabhu, Bryan D. Vogt, Shuhui Kang, Ashwin Rao, Sushil K. Satija, Wen-li Wu, Karen Turnquest
2:20 PM	268	Study of initiator anchoring onto silicon substrate by surface initiated polymerization in ATRP Zhiyi Bao, Merlin L. Bruening, Gregory L. Baker
2:45 PM	269	Methods for the preparation of defined embedded defects in polymer opals Birger Lange, Rudolf Zentel, Christopher Ober
3:10 PM		Intermission
3:30 PM	270	Photolabile functional polymers for surface patterning and specific attachment of nanostructures Marta Millaruelo, Barbara Sieczkowska, Martin Messerschmidt, Michael Mertig, Jörg Opitz, Lukas Eng, Wolfgang Pompe, Brigitte Voit
3:55 PM	271	Molecular ruler lithography processes and their application to sub 50nm MOS Devices Shyamala Subramanian, Jeffrey Catchmark
4:20 PM	272	Pattern generation in photonic crystal hydrogel films via photopolymerization Yurong Ying, Ping Jiang, Justin R. Lawrence, Stephen H. Foulger

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