POLY 312 |
| The National Nanotechnology Initiative (NNI) has focused hundreds of millions of dollars of research funds into the area of nanoscale structure fabrication. Meanwhile, the drive to manufacture cheaper and more efficient semiconductor devices has inspired continuing improvements in imaging materials science and high resolution patterning technology for several decades. Billions of dollars have been spent in efforts to devise methods and materials that enable the printing of ever smaller transistors. The lithographic process that has been used to generate these “nano-structures” is becoming extremely expensive and the process latitude is shrinking. The cost of the process threatens the economics of the semiconductor manufacturing industry. The state of this high resolution imaging technology and a description of the new materials challenges and opportunities that it creates will be presented. |
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Polymers For Enabling Nanoscale Patterning
8:30 AM-12:30 PM, Wednesday, 29 March 2006 OMNI at CNN Center -- Dogwood A, Oral
Division of Polymer Chemistry |