Nanoprocessing of polythiophenes: Direct-write and nanoimprint for conductive polymer pattern generation

POLY 319

Frank Nichols1, Arvind Kumar2, Jia Choi2, Eric R. Catuccio2, and Manuel Marquez, MMSAMMY@aol.com3. (1) University of Connecticut, CT, (2) Department of Chemistry and the Polymer Program, University of Connecticut, 97 N. Eagleville Rd (U-136), Storrs, CT 06269-3136, (3) New Technology Research, INEST Group, Philip Morris USA, Research Center T2, 4201 Commerce Rd., Richmond, VA 23234
Herein we report the rapid production of conjugated polymer nanopatterns via direct write nanolithography using electrochemical atomic force microscopy and nanoimprint lithography. Both patterning processes utililize our solid-state oxidative crosslinking precursor polymer approach for conductive polymer generation. Feasibility studies using thermal nanoimprint lithography were performed to produce conjugated polymers of approximately 180 nm width and 20 nm gaps across a 9 sq. inch indium doped tin oxide coated glass substrate.
 

Polymers For Enabling Nanoscale Patterning
8:30 AM-12:30 PM, Wednesday, 29 March 2006 OMNI at CNN Center -- Dogwood A, Oral

Division of Polymer Chemistry

The 231st ACS National Meeting, Atlanta, GA, March 26-30, 2006