POLY 320 |
| The current progress in the area of block copolymer-based thin film architectures for obtaining micro- and nanopatterned functional biointerfaces is reviewed. The surface chemistry of polystyrene-block-poly(t-butyl acrylate) (PS690-b-PtBA1210) films and the (sub)micrometer to sub-100nm patterning using “top-down” reactive microcontact printing (mCP), dip pen nanolithography (DPN), as well as the fabrication of nanoperiodic arrays of these reactive block copolymers, will be discussed. Three different mCP approaches, namely (i) direct molecular transfer, (ii) local passivation with PEG / functionalization from buffer and (iii) local deprotection / functionalization from buffer provided micrometer to sub-micrometer (bio)molecular patterns on the PtBA skin layer of PS690-b-PtBA1210 films. These approaches were extended to the nanometer size regime by exploiting the microphase separation in solvent treated block copolymer films. Patterning on multiple length scales was accomplished in conjunction with reactive mCP. Using DPN true nanoscale patterns were realized in a sequential manner by depositing PAMAM dendrimers to the activated surfaces. |
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Polymers For Enabling Nanoscale Patterning
8:30 AM-12:30 PM, Wednesday, 29 March 2006 OMNI at CNN Center -- Dogwood A, Oral
Division of Polymer Chemistry |