POLY 314 |
| New techniques for fabricating structures with nanometer dimensions are critically important to advances in nanoscience and technology. Methods that use molds to imprint features into thin polymer films have attracted considerable attention. Although it has been demonstrated that patterning with these techniques at the 5-10 nm range is possible, the fundamental limits in resolution are not well established. The uncertain polymer physics that governs the molding process and the absence of a reliable means to evaluate the resolution at sub-5 nm length scales present significant challenges. This talk desribes some of our recent efforts to explore these limits with a simple experimental procedure that exploits molds derived from individual single walled carbon nanotubes. The experiments reveal capabilities for patterning features with dimensions as small as 1 nm, and some chemical and physical effects that are important for operation in this regime. |
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Polymers For Enabling Nanoscale Patterning
8:30 AM-12:30 PM, Wednesday, 29 March 2006 OMNI at CNN Center -- Dogwood A, Oral
Division of Polymer Chemistry |