Optical properties of isolated sub-micron nanoapertures fabricated by nanosphere lithography

ANYL 135

Jean K Chung, jeachung@indiana.edu1, Tiberiu Onuta2, William L. Schaich3, and Bogdan Dragnea, dragnea@indiana.edu2. (1) Department of Chemistry, Indiana University Bloomington, 800 E. Kirkwood Ave., Bloomington, IN 47405, (2) Department of Chemistry, Indiana University, 800 E. Kirkwood Ave, Bloomington, IN 47405-7102, (3) Department of Physics, Indiana University, Bloomington, IN 47405
Optical transmission at visible wavelengths of isolated sub-micron apertures fabricated by nanosphere lithography in metal films has been studied as a function of metal, aperture diameter, and film thickness. The general goal of the paper is to give a quantitative estimate of the degree of control that this particular method of fabrication exerts on the optical properties of isolated apertures and establish a benchmark for other methods of fabrication. We report here on the following specific parameters: (1) the variance in the optical properties (transmission, depolarization) and its relationship with the variance in the particle diameter. (2) the dependence of optical transmission and depolarization on the film thickness and the aperture diameter. To assess the departure of the fabricated hole from the ideal case of an electromagnetic model using bulk metal optical parameters and ignoring the film surface roughness, we provide a comparison between finite difference time domain computations and experimental data.
 

General Papers
7:00 PM-9:00 PM, Sunday, 28 August 2005 Washington DC Convention Center -- Hall A, Poster

Sci-Mix
8:00 PM-10:00 PM, Monday, 29 August 2005 Washington DC Convention Center -- Hall A, Sci-Mix

Division of Analytical Chemistry

The 230th ACS National Meeting, in Washington, DC, Aug 28-Sept 1, 2005