COLL 163 |
| Mary E. Anderson1, Erin M. Carter1, Adam R. Kurland1, Charan Srinivasan2, Mark W. Horn2, and Paul S. Weiss3. (1) Department of Chemistry, Pennsylvania State University, 104 Chemistry Research Building, Box 53, University Park, PA 16802, (2) Department of Engineering Science and Mechanics, Pennsylvania State University, (3) Department of Chemistry and Physics, Pennsylvania State University, 152 Davey Lab, Penn State University, University Park, PA 16802 |
| Self-assembly in combination with lithographic processing can be used to create nanostructures with precise spacing and edge resolution reaching the nanometer-scale. A molecular ruler resist of self-assembled multilayers is selectively deposited on initial lithographically defined gold structures. This resist can be tuned to a desired thickness based on the number of layers deposited. Then, metal is deposited on the sample and the resist is removed, yielding spacings between metal structures dependent on the tailored resist’s dimensions. Work is underway to build molecular ruler resists independently either by capping selected regions of growth or by orthogonal growth of two different multilayer systems. A scheme in development is electroless metal deposition of the secondary metal to improve resist lift-off. Molecular ruler resists can withstand the rigors of lithographic processing and are being developed to advance this method toward device fabrication. |
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Posters: Fundamental Research in Surface and Colloid Chemistry
6:00 PM-8:00 PM, Monday, August 23, 2004 Pennsylvania Convention Center -- Hall C, Poster
Division of Colloid and Surface Chemistry |