Nanowear of ultrathin superlattice films deposited on silicon

COLL 256

Jerzy T. Wyrobek1, Hanna Wrzesinska2, Andrew Strom1, Zygmunt Rymuza3, and Andrzej Nowek3. (1) Hysitron Inc, 10025 Valley View Road, Minneapolis, MN 55344, (2) Institute of Electron Technology, Al.Lotnikow 32/46, 02-668 Warsaw, Poland, (3) Institute of Micromechanics and Photonics, Warsaw University of Technology, Sw.A.Boboli 8, 02-525 Warsaw, Poland
Ultrathin ( with thickness below 200 nm) nitride (TiN, CrN, NbN) multilayer (with thickness of one layer 2-5 nm) superlattice films useful for e.g. MEMS applications deposited on silicon by Physical Vapour Deposition technique were tested . The nanowear tests on 5 x5 um scan size were carried out. The effect of the construction of the film on its wear resistance was observed. The energy of friction introduced to the tested system was evaluated and the energy density of friction was then computed at measured volume of the worn material removed during the test. The nanoscratch linear tests were performed additionally to estimate the friction force during the wear and to calculate the energy of friction. The results of the nanowear studies were also compared with the results of nanoindentation tests and wetting (contact angle measurements) studies.The friction energy (ratio of energy of friction to volume of material worn) was found to be correlated with nanomechanical properties and the adhesive properties and real contact pressure calculated using JKR model.