COLL 194 |
| Nao Hosaka1, Keiji Tanaka2, Hideyuki Otsuka3, and Atsushi Takahara3. (1) Graduate School of Engineering, Kyushu University, Hakozaki, Higashi-ku, Fukuoka, 8128581, Japan, (2) Department of Applied Chemistry, Kyushu University, Higashi-ku, Fukuoka, 8128581, Japan, (3) Institute for Materials Chemistry and Engineering, Kyushu University, 6-10-1 Hakozaki, Higashi-ku, Fukuoka, 812-8581, Japan |
| Polymer thin films used in various technological applications become ever thinner with the miniaturization of devices. However, such films are not thermally stable, and will dewet the substrate above its glass transition temperature. In this study, the strategy to inhibit the dewetting of thin polystyrene (PS:Mn=2,100, Mw/Mn=1.06) films was proposed. 50nm thick PS thin film with octacyclopentylsilsesquioxane (cPOSS) as a nanofiller was prepared by a spin coating. The dewetting behavior was observed by optical microscopy. The bulk Tg of PS was slightly increased with an addition of cPOSS nanofiller up to 20 wt %. Even after annealing for 3 h at 373 K, no appreciable dewetting was observed by optical microscopy in the PS thin film containing 10 wt% cPOSS nanofiller. On the other hand, the PS thin film without nanofiller was completely dewetted. This inhibition of dewetting can be attributed to the interaction between the cPOSS nanofiller and the substrate accompanying modification effect of the PS-substrate interface. |
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Posters: Fundamental Research in Surface and Colloid Chemistry
6:00 PM-8:00 PM, Monday, March 29, 2004 Disneyland -- North Exhibit Hall, Poster
Division of Colloid and Surface Chemistry |