COLL 102 |
| Atsushi Takahara1, Hirotaka Ishizuka2, Jub Fukai2, and Masamichi Morita3. (1) Institute for Materials Chemistry and Engineering, Kyushu University, 6-10-1 Hakozaki, Higashi-ku, Fukuoka, 812-8581, Japan, (2) Department of Chemical Engineering, Kyushu University, Fukuoka, 812-8581, Japan, (3) Fundamental Research Department, Chemical Division, Daikin Industries, Ltd, 1-1 Nishi Hitotsuya, Settsu-shi, 566, Japan |
| Micropatterned fluoroalkylsilane monolayers were fabricated on a Si-wafer substrate by chemical vapor adsorption (CVA) of fluoroalkyltrialkoxysilane and vacuum ultraviolet (VUV)-ray photodecomposition under photomask with line-pattern. Field-emission scanning electron microscopic (FESEM) observation revealed that the micropatterned surface of fluoroalkylsilane and bare Si-wafer corresponding to the line-width of photomask was formed Contact angle measurement revealed the anisotropy of water contact angles parallel and perpendicular to the line direction. Droplets of xylene solution of polystyrene were deposited on the 10mm line-pattern by inkjet process from the orifice with a diameter of 50mm It was revealed that the xylene solution was repelled from the oleophobic fluoroalkylsillane surface and the PS film with 10mm width was locally formed on the bare Si-wafer surface. |
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Symposium in Memory of Arthur W. Adamson
8:30 AM-11:50 AM, Monday, March 29, 2004 Marriott -- Orange County 4, Oral
Division of Colloid and Surface Chemistry |