COLL 305 |
| Howard Fairbrother1, Chris Perry1, Nadir S. Faradzhev2, and T. E. Madey2. (1) Department of Chemistry, Johns Hopkins University, 3400 North Charles Street, Baltimore, MD 21211, (2) Department of Physics and Astronomy, Rutgers, the State University of New Jersey, 136 Frelinghuysen Rd, Piscataway, NJ 08854 |
| The electron induced decomposition of CF2Cl2, CCl4, CHCl3, CH2Cl2 and CH3I in water/(ice) films at ~100 K were studied using reflection absorption infrared spectroscopy (RAIRS), XPS and TPD. These studies were motivated by the importance of electron stimulated decomposition processes in organohalide chemistry. RAIRS results indicate that carbonyl dihalides (COCl2 and COF2) are important reactive intermediates in the electron induced decomposition of R-X species in these water(ice) films, ultimately leading to the formation of CO2. In addition to the sensitivity of the reaction pathway to the chemical identity of the parent molecule, the organohalide: water ratio also strongly influences product partitioning with CO2 being favored in H2O rich films while the formation of a carbonaceous film dominates in organohalide rich films. Reaction products identified by RAIRS point to the dominance of DEA and the importance of the carbon-containing radical produced during DEA in determining the decomposition pathway of the organohalide. |
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Vibrational Analyses of Dry and Wet Surfaces
8:30 AM-11:30 AM, Tuesday, March 30, 2004 Marriott -- Grand Ballroom H, Oral
Division of Colloid and Surface Chemistry |