COLL 65 |
| James M. Helt, Department of Chemistry, CUNY-College of Staten Island and The Graduate Center, 2800 Victory Boulevard, Staten Island, NY 10314 and James D. Batteas, Surface and Microanalysis Science Division, National Institute of Standards and Technology, 100 Bureau Drive Mailstop 8372, Gaithersburg, MD 20899. |
| Forecasting wear facilitates device design by bringing to light the mechanisms of wear that impact operational lifetime. Nanoscopic AFM studies are able to furnish fundamental details on charge and defect nucleation and surface reconstructions that are critical components activated in a wearing oxide contacts. Here a simple model, employing Hertz continuum mechanics theory is described that determines the most appropriate scan size for performing AFM wear trials. A contact radius – line step relationship indicates that overlap of successive scans results if the contact radius to line step (LS) ratio (CRLS) is < 1/2. This approach can help account for inaccuracies associated with scan overlap in wear trials. Wear studies were conducted on muscovite mica with a Si3N4 tip and clearly illustrate the effects of scan overlap. This model consistently underestimates severe wear trends, which is to be expected in light of Hertzian principles employed. |
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Friction, Lubrication, and Adhesion in Micro- and Nano-Scale Devices
2:00 PM-5:00 PM, Sunday, March 28, 2004 Marriott -- Orange County 5, Oral
Division of Colloid and Surface Chemistry |