COLL 296 |
| Mary E. Anderson, Department of Chemistry, Pennsylvania State University, 152 Davey Lab, Box 3, University Park, PA 16802, Mark W. Horn, Department of Engineering Science and Mechanics, Pennsylvania State University, and Paul S. Weiss, Departments of Chemistry and Physics, Pennsylvania State University, 152 Davey Laboratory, University Park, PA 16802-6300. |
| Fundamental understanding of chemical self-assembly has undergone much investigation and is now at the forefront for patterning surfaces and for the creation of hierarchical structures with nanoscale precision. We apply self-assembly to form multilayers on structures formed by nanolithographic techniques to create patterns with spacings in the 10-100 nm regime. The key is to use robust multilayers, which do not contain pinhole defects (unlike monolayers) and are able to withstand the rigors of lithographic processing. Controlled placement and thickness of these multilayers form “molecular ruler” resists to measure the spacings precisely between lithographically defined structures. We have demonstrated this approach with nanostructures generated by electron beam and photolithography, as well as those based entirely on self-assembly. We will discuss our approaches to designing and patterning complex nanostructures by exploiting methods of directed self-assembly to build molecular ruler resists with independently controlled materials and spacings. |
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Nanoscience and Nanotechnology
6:00 PM-8:00 PM, Monday, March 29, 2004 Disneyland -- North Exhibit Hall, Poster
Division of Colloid and Surface Chemistry |