COLL 23 |
| Gary M McClelland1, Charles T. Rettner1, Mark W. Hart1, Martha I. Sanchez2, Margaret E. Best3, and Bruce D. Terris3. (1) IBM Almaden Research Cetner, 650 Harry Road, San Jose, CA 95120, (2) IBM Almaden Research Center, San Jose, CA 95120, (3) Hitachi San Jose Research Center, 650 Harry Road, San Jose, CA 95120 |
| Because imprint lithography involves bringing two solid surface into near contact, a number of issues familiar in tribology are relevant. This talk will review some of these issues, drawing upon the work of other groups as well as on our own work in patterning magnetic media. Some examples: Uniform resist films can be generated either by spinning a thin film, or by allowing resist to flow between two ultra-flat surfaces. The contact force must be controlled to avoid distortion. Surface treatments are used to promote adhesion or improve imprinter release. Flexible imprinters may simplify the contact mechanics, but limit the resolution. Surfactant liquids can be used to simplify imprinter release. Direct transfer of solid material between surfaces can be used as a form of lithography. Dewetting of thin spin-cast liquid resist films must be controlled. |
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Friction, Lubrication, and Adhesion in Micro- and Nano-Scale Devices
8:30 AM-11:30 AM, Sunday, March 28, 2004 Marriott -- Orange County 5, Oral
Division of Colloid and Surface Chemistry |