IEC 160 |
| Sathyajith Ravindran, Department of Chemical and Environmental Engineering, University of California, B-136 Bourns Hall, University of California, Riverside, Riverside, CA 92521, Shalini Prasad, Department of Electrical Engineering, University of California at Riverside, B148 Bourns Hall, University of California at Riverside, Riverside, CA 92521, Brooke Colburn, Department of Mechanical Engineering, University of California at Riverside, B136 Bourns Hall, University of California at Riverside, Riverside, CA 92521, Mihri Ozkan, Departments of Electrical Engineering and Chemical and Environmental Engineering, University of California at Riverside, Bourns Hall A241, Riverside, CA 92521, and Cengiz Ozkan, Department of Mechanical Engineering, University of California, A305 Bourns Hall, University of California, Riverside, Riverside, CA 92521. |
| Superior mechanical and electrical properties have made carbon nanotubes attractive candidates in nanoelectronic devices and biological applications. CNTs for neuronal growth research are extremely new. We here report the use of patterned Carbon nanotubes modified with neuron growth factors for building neural networks. Silicon substrate was patterned with iron catalyst using E-Beam lithography followed by annealing at 300 °C to oxidize the Fe catalyst patterns. Carbon Nanotubes are grown using chemical vapor deposition technique preferentially over the iron patterns. Growth factor-4-Hydroxynonenal (4-HNE) is immobilized on the Carbon Nanotubes by simply incubating the substrate in a 4-HNE solution to make them more biocompatible. Neurons are plated on the substrate and the directional growth and activity was investigated. Similar studies are carried out with silicon substrates with patterned Anodic Aluminum Oxide (AAO) lines. The AAO pores are also filled with the growth factor 4-HNE. The long-term response is still being investigated |
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General Poster Session
5:00 PM-7:00 PM, Tuesday, March 25, 2003 Convention Center -- Hall G, Poster
Sci-Mix
Division of Industrial and Engineering Chemistry |