IEC 39 |
| Kyung M. Choi, Room # : 1C-352, Bell Laboratories, Lucent Technologies, 600-700 Mountain Ave., Murray Hill, NJ 07974 and John A. Rogers, Nanotechnology Research Department, Bell Laboratories, Lucent Technologies, 600 Mountain Avenue, Room 1D-332, Murray Hill, NJ 07974. |
| 'Soft lithography' refers to a class of patterning techniques that rely on high resolution elastomeric elements as stamps, molds and conformable photomasks. These approaches are attractive for nanofabrication in part because they provide low cost alternatives to photolithography particularly for unconventional applications in areas such as plastic or molecular electronics. However, the resolution of soft lithographic procedures is often limited by the mechanical strength and elastic moduli of commercial elastomers which are typically used for soft lithography but which were developed for other applications. We introduce here a new chemistry, based on a modified polydimethylsiloxane (PDMS) elastomer structure, for stamps that are designed specifically for soft lithography in the submicron regime. The excellent mechanical characteristics (i.e. elastic modulus and elongation at break) of these new stamp materials, their photocurabilities and low linear shrinkages (< 1 %) represent key attributes. We demonstrate the capability of the new photocured PDMS stamps for replica molding and microcontact printing (two representative soft lithographic methods) of structures with dimensions deep into the sub-micron range; we compare their performances to elements made using the commercially available PDMS materials. We also illustrate some strategies for controlling the physical properties of the new PDMS stamps by changing the mixing ratios of different specially designed photocured PDMS prepolymers. |
|
General Papers in Advanced Materials and Nanotechnology (sponsored by Advanced Materials & Nanotechnology Subdivision)
1:30 PM-5:24 PM, Sunday, March 23, 2003 Convention Center -- Room 394, Oral
Division of Industrial and Engineering Chemistry |