IEC 180 |
| Kal Renganathan Sharma, Department of Chemial and Biotechnology, Department of Chemial and Biotechnology, Anna University - Sakthi Engineering College, Principal, Mathur Post, Oragadam, Kancheepuram, Chennai, 602105, India |
| Semi-conductor wiring and the US defense armor plates require high purity Titanium. The current Kroll process is used for 99% purity Titanium. Oxygen, Cromium,Iron, and Nickel are the identified contaminants. Two-staged fluidized bed process design is suggested in a reducing atmosphere to hydrogenate Titanium Tetrachloride. This is followed by dehydration to powder under vacuum heating. Titanium Tetrachloride is produced by acid washing rutile ore. Particulation of Titanium is modeled. The 4 nine purity Titanium can be produced.The changing particle size offset the fluidization hydrodynamics.Oxygen with less than 300 ppm and chlorine less than 60ppm may be produced.
|
|
General Poster Session
5:00 PM-7:00 PM, Tuesday, March 25, 2003 Convention Center -- Hall G, Poster
Division of Industrial and Engineering Chemistry |